Outside Front Cover: Plasma Process. Polym. 10/2022

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چکیده

Outside Front Cover: Photograph of the face a vacuum ultraviolet (VUV)-emitting lamp reflected by 15 cm (6”) diameter silicon wafer. Having radiating area 100 cm2, is optical source for commercial VUV photolithography system, manufactured Cygnus Photonics, with which polymers serve as dry photoresist. Its peak emission wavelength 172 nm allows photopatterning and cellulose 10 depth precision. Further details can be found in article Jinhong Kim, Andrey E. Mironov, Jin H. Cho, Dane S. Sievers, Cyrus M. Herring, Sehyun Park, Peter P. Sun, Zhihu Liang, Wenyuan Chen, Sung-Jin J. Gary Eden (e2200075)

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ژورنال

عنوان ژورنال: Plasma Processes and Polymers

سال: 2022

ISSN: ['1612-8869', '1612-8850']

DOI: https://doi.org/10.1002/ppap.202270027